Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances

نویسندگان

  • Martijn van Sebille
  • Jort Allebrandi
  • Jim Quik
  • René A.C. M. M. van Swaaij
  • Frans D. Tichelaar
  • Miro Zeman
چکیده

We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limited range is calculated using the stoichiometry of the as-deposited film and the crystallinity of the annealed film as input parameters. Multiplying this probability with the nanocrystal density results in the density of non-touching and closely spaced silicon nanocrystals. This method can be used to estimate the best as-deposited stoichiometry in order to achieve optimal nanocrystal density and spacing after a subsequent annealing step.

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عنوان ژورنال:

دوره 11  شماره 

صفحات  -

تاریخ انتشار 2016